Semiconductor processing by plasma immersion ion implantation-Reference-Cited by-同舟云学术

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Semiconductor processing by plasma immersion ion implantation

Published:1998-09 Issue:1-2 Volume:253 Page:258-268
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Ensinger W.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference47 articles.

1. J.R. Conrad, C. Forest, in: IEEE International Conference on Plasma Science, Saskatoon, Canada, 1986, IEEE, New York, 1986, p. 28.

2. Plasma immersion ion implantation using plasmas generated by radio frequency techniques

3. W. Ensinger, Surf. Coat. Technol. 100–101 (1998) 112.

4. Plasma immersion ion implantation—a fledgling technique for semiconductor processing

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