Structure characterization of carbon and fluorine-doped silicon oxide films with low dielectric constant
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference31 articles.
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4. A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnections
5. Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
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