Effect of deposition temperature on the bonding configurations and properties of fluorine doped silicon oxide film-Reference-Cited by-同舟云学术

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Effect of deposition temperature on the bonding configurations and properties of fluorine doped silicon oxide film

Published:2011-10 Issue:1 Volume:520 Page:35-40
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lu Wei-Lun,Kuo Ting-Wei,Huang Chun-Hsien,Wang Na-Fu,Tsai Yu-Zen,Wang Ming -Wei,Hung Chen-I.,Houng Mau-Phon

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Structure and chemical composition of fluorinated SiO2 films deposited using SiF4/O2 plasmas

2. Interconnect scaling scenario using a chip level interconnect model

3. Structure characterization of carbon and fluorine-doped silicon oxide films with low dielectric constant

4. Study on precipitations of fluorine-doped silicon oxide

5. Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition of high transparent and hard optical coating by tetraethylorthosilicate plasma polymerization;Thin Solid Films;2020-03

2. Characterization of fluorinated silica thin films with ultra-low refractive index deposited at low temperature;Thin Solid Films;2015-02

3. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition;Journal of Applied Physics;2013-12-07

4. Supported F-Doped α-Fe₂O₃ Nanomaterials: Synthesis, Characterization and Photo-Assisted H₂ Production;Journal of Nanoscience and Nanotechnology;2013-07-01

5. Fluorine doped Fe2O3 nanostructures by a one-pot plasma-assisted strategy;RSC Advances;2013

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