Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4845755
Reference32 articles.
1. Detection of defect states in low-k dielectrics using reflection electron energy loss spectroscopy
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