Influence of an ammonia activation prior to the PECVD SiN deposition on the solar cell performance

Author:

Hauser Alexander,Spiegel Markus,Fath Peter,Bucher Ernst

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. The hydrogen content of plasma-deposited silicon nitride;Lanford;J. Appl. Phys.,1978

2. J. Szlufcik, K. De Clercq, P. De Schepper, J. Poortmans, A. Buczkowski, J. Nijs, R. Mertens, Improvement in multicrystalline silicon solar cells after thermal treatment of PECVD silicon nitride AR coating, Proceedings of the 12th EC PVSEC, Amsterdam, The Netherlands, 1994, p. 1018.

3. Physics of Radiation Effects in Crystals;Guseva,1986

4. M. Bruel, B. Aspar, B. Charlet, C. Maleville, T. Poumeyrol, A. Soubie, A.J. Auberton-Herve, J.M. Lamure, T. Barge, F. Metral, S. Trucchi, “Smart cut”: a promising new SOI material technology, IEEE International SOI Conference Proceedings, New York, USA, 1995.

5. Orientation dependence of blistering in H-implanted Si;Zheng;J Appl Phys,2000

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