Author:
Wang J.J,Lambers E.S,Pearton S.J,Ostling M,Zetterling C.-M,Grow J.M,Ren F
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
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5. Etching of 6H‐SiC and 4H‐SiC using NF 3 in a Reactive Ion Etching System
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