AES and EELS study of aluminium oxide thin films

Author:

Kapsa R,Stará I,Zeze D,Gruzza B,Matolı́n V

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. C. Robert, Doctoral thesis, Université Blaise Pascal, Clermont Ferrand, 1996.

2. K. Mašek, V. Matolı́n, Proceedings of ICTF-10 Conference, submitted 1996.

3. On the stability of vapor grown palladium particles supported on amorphous alumina

4. Interface-controlled phase transformation and abnormal grain growth of α-Al2O3 in thin γ-alumina films

5. Electronic and crystallographic structure of γ-alumina thin films

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1. Improving the cavitation corrosion resistance of 6061 aluminum alloy by anodizing;Electrochimica Acta;2024-11

2. Localized defect states and charge trapping in atomic layer deposited-Al2O3 films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-01

3. Nanomorphology of Aluminum Oxide Layer after Argon Ion Bombardment;Journal of Nano Research;2015-05

4. Changes in a surface of polycrystalline aluminum upon bombardment with argon ions;Russian Journal of Physical Chemistry A;2014-08-31

5. New Sol-Gel Route for the Preparation of Pure α-Alumina at 950°C;Journal of the American Ceramic Society;2004-12-20

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