Microstructure of Ta2O5 films grown by the anodization of TaNx
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Study of amorphous Ta2O5 thin films by DC magnetron reactive sputtering
2. Correlation of sputtering conditions with electronic conduction in Ta2O5 films
3. Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition
4. Metal‐oxide‐semiconductor characteristics of chemical vapor deposited Ta2O5films
5. Effect of rapid thermal annealing treatment on electrical properties and microstructure of tantalum oxide thin film deposited by plasma‐enhanced chemical vapor deposition
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2. Influence of nitrogen species on the porous-alumina-assisted growth of TiO2 nanocolumn arrays;Electrochimica Acta;2018-08
3. Investigation of the effect of anodization time and annealing temperature on the physical properties of ZrO2thin film on a Si substrate;Materials Research Express;2017-08-29
4. Synthesis of TaAlO4 compound and Al2O3–TaAlO4 composite ceramic by mechanical alloying and their sintering;Ceramics International;2015-03
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