Layer-transferred gallium arsenide heterojunction bipolar transistor on insulator substrate
Author:
Funder
National Research Foundation Singapore
Ministry of Education - Singapore
Singapore-MIT Alliance for Research and Technology Centre
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference16 articles.
1. K.H. Lee, A. Jandl, Y.H. Tan, E.A. Fitzgerald, C.S. Tan, Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber, AIP Adv. 3 (9) (2013) 092123, doi: 10.1063/1.4822424.
2. MOCVD growth of InGaP/GaAs heterojunction bipolar transistors on 200 mm Si wafers for heterogeneous integration with Si CMOS;Loke;Semicond. Sci. Technol.,2018
3. In 0.49 Ga 0.51 P/GaAs heterojunction bipolar transistors (HBTs) on 200 mm Si substrates: effects of base thickness, base and sub-collector doping concentrations;Wang;AIP Adv.,2018
4. Comparative studies of the growth and characterization of germanium epitaxial film on silicon (001) with 0° and 6° offcut;Lee;J. Electron. Mater.,2013
5. K.H. Lee, S. Bao, B. Wang, C. Wang, S.F. Yoon, J. Michel, E.A. Fitzgerald, C.S. Tan, Reduction of threading dislocation density in Ge/Si using a heavily As-doped Ge seed layer, AIP Advances 6 (2) (2016) 025028, doi: 10.1063/1.4943218.
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