-ray-induced intrinsic defect processes in fluorine-doped synthetic SiO2 glasses of different fluorine concentrations
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference30 articles.
1. Correlated defect creation and dose-dependent radiation sensitivity in amorphousSiO2
2. Defect pair creation through ultraviolet radiation in dense, amorphousSiO2
3. Evidence for pair generation of anE’ center and a nonbridging oxygen-hole center in γ-ray-irradiated fluorine-doped low-OH synthetic silica glasses
4. Generation ofE’ centers and oxygen hole centers in synthetic silica glasses by γ irradiation
5. Physical Disorder and Optical Properties in the Vacuum Ultraviolet Region of AmorphousSiO2
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