Defect pair creation through ultraviolet radiation in dense, amorphousSiO2
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.42.2617/fulltext
Reference20 articles.
1. Laser heating of free electrons in wide-gap optical materials at 1064 nm
2. Laser-induced modifications and the mechanism of intrinsic damage in wide gap optical materials
3. Radiation Damage in SiO2/Si Induced by VUV Photons
4. Ultraviolet‐induced defect creation in amorphous SiO2exposed to an O2plasma
5. Self-trapped holes in amorphous silicon dioxide
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