Surface morphologies of excimer-laser annealed BF2+ implanted Si diodes-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Surface morphologies of excimer-laser annealed BF2+ implanted Si diodes

Published:2004-12 Issue: Volume:114-115 Page:109-113
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Burtsev A.,Schut H.,Nanver L.K.,Veen A. van,Slabbekoorn J.,Scholtes T.L.M.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference16 articles.

1. Annealing of ultrashallow p+/n junction by 248 nm excimer laser and rapid thermal processing with different preamorphization depths

2. Diffusion of ion implanted boron in preamorphized silicon

3. Mechanisms of implant damage annealing and transient enhanced diffusion in Si

4. Implantation and transient B diffusion in Si: The source of the interstitials

5. Control of transient enhanced diffusion of boron after laser thermal processing of preamorphized silicon

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-Complexity Full-Melt Laser-Anneal Process for Fabrication of Low-Leakage Implanted Ultrashallow Junctions;Journal of Electronic Materials;2011-09-09

2. Electrical Characterization of Residual Implantation-Induced Defects in the Vicinity of Laser-Annealed Implanted Ultrashallow Junctions;MRS Proceedings;2006

3. Excimer laser annealing of B and BF2 implanted Si;Materials Science and Engineering: B;2005-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3