Author:
Pinacho R.,Jaraiz M.,Castrillo P.,Rubio J.E.,Martin-Bragado I.,Barbolla J.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference23 articles.
1. Point defects and dopant diffusion in silicon
2. Arsenic deactivation enhanced diffusion: A time, temperature, and concentration study
3. Clustering equilibrium and deactivation kinetics in arsenic doped silicon
4. Simulation of Semiconductor Processes and Devices;Jaraiz,2001
5. J.E. Rubio, M. Jaraiz, I. Martin-Bragado, R. Pinacho, P. Castrillo, J. Barbolla, presented at the Spring meeting E-MRS 2004 (symposium B) (in press).
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献