Advanced front-end processes for the 45nm CMOS technology node-Reference-Cited by-同舟云学术

Advanced front-end processes for the 45nm CMOS technology node

Published:2004-12 Issue: Volume:114-115 Page:118-129
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Collart E.J.H.,Felch S.B.,Graoui H.,Kirkwood D.,Tallavarjula S.,Berg J.A. Van den,Hamilton J.,Cowern N.E.B.,Kirkby K.J.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference22 articles.

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4. Proceedings of the 14th International Conference on Ion Implantation Technology (IIT-2002);Collart,2003

5. Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth

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