Control of epitaxial orientation of TiN thin films grown by N-implantation-Reference-Cited by-同舟云学术

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Control of epitaxial orientation of TiN thin films grown by N-implantation

Published:1998-06 Issue: Volume:130-132 Page:643-650
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kasukabe Y,Ito A,Nagata S,Kishimoto M,Fujino Y,Yamaguchi S,Yamada Y

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. Structure and properties of TiN coatings

2. Structural analysis of TiNx films prepared by reactive-ion-beam-enhanced deposition

3. Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnetron sputtering

4. Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition

5. Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and characterization of single (200)-oriented TiN thin films deposited by DC magnetron reactive sputtering;Rare Metals;2015-07-16

2. Micro Structure of N-Implanted Ti Thin Films Prepared by Ion Beam Sputtering Deposition;Ceramic Transactions Series;2012-04-25

3. Nanocrystalline HfN produced by mechanical milling: Kinetic aspects;Acta Materialia;2001-12

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