Micro Structure of N-Implanted Ti Thin Films Prepared by Ion Beam Sputtering Deposition

Author:

Muraishi Shinji,Aizawa Tatsuhiko

Publisher

John Wiley & Sons, Inc.

Reference8 articles.

1. Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition,;Hiramatsu;Journal of Vacuum Science Technology,1995

2. XRD and XPS Study on Reactive Plasma Sprayed Titanium-Titanium Nitride Coatings”,;Galvanetto;Thin Solid Films,2002

3. Effect of Chlorine Distribution Profiles on Tribological Properties for Chlorine-implanted Titanium nitride films”,;Mitsuo;Surface and Coating Technology,2002

4. Control of Epitaxial Orientation of TiN Thin Films Grown by N-implantation”,;Kasukabe;Applied Surface Science,1998

5. Residual Strain in Deuterated Ti thin Films,;Scardi;Matterials Letters,1998

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