Novel applications for laser ablation of photopolymers-Reference-Cited by-同舟云学术

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Novel applications for laser ablation of photopolymers

Published:2002-01 Issue:1-4 Volume:186 Page:14-23
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lippert T,David C,Hauer M,Masubuchi T,Masuhara H,Nomura K,Nuyken O,Phipps C,Robert J,Tada T,Tomita K,Wokaun A

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference33 articles.

1. Self‐developing photoetching of poly(ethylene terephthalate) films by far‐ultraviolet excimer laser radiation

2. Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laser

3. Excimer ablation lithography (EAL) for TFT-LCD

4. Quantification of polyimide carbonization after laser ablation

5. Ultraviolet laser ablation of polyimide films

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