A comprehensive study of polysilicon resistors for CMOS ULSI applications-Reference-Cited by-同舟云学术

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A comprehensive study of polysilicon resistors for CMOS ULSI applications

Published:2003-04 Issue:4 Volume:33 Page:193-208
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Chuang Hung-Ming,Thei Kong-Beng,Tsai Sheng-Fu,Lu Chun-Tsen,Liao Xin-Da,Lee Kuan-Ming,Chen Hon-Rung,Liu Wen-Chau

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference16 articles.

1. Electrical properties of heavily doped polycrystalline silicon-germanium films

2. A novel photodetector using MOS tunneling structures

3. WA-A4 Electrical trimming of polycrystalline Silicon resistors and its application to analog IC's

4. The design of thin-film polysilicon resistors for analog IC applications

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4. A Physics-Based Compact Model for Polysilicon Resistors;IEEE Electron Device Letters;2010-11

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