Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition-Reference-Cited by-同舟云学术

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Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

Published:2000-09 Issue:2-3 Volume:165 Page:193-202
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Puurunen R.L,Root A,Sarv P,Haukka S,Iiskola E.I,Lindblad M,Krause A.O.I

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference46 articles.

1. Pd/Si3N4 catalysts: preparation, characterization and catalytic activity for the methane oxidation

2. Isdmerization of Olefins Catalyzed by Silica-Polyalumazine-Palladium Complexes

3. Hydroformylation of Heptene-1 Catalyzed by some Inorganic Polymer-Metal Complexes

4. Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

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1. Surface chemistry in atomic layer deposition of AlN thin films from Al(CH₃)₃ and NH₃ studied by mass spectrometry;Journal of Materials Chemistry C;2024

2. Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride;The Journal of Physical Chemistry C;2023-08-17

3. Tailorable stimulated Brillouin scattering in a partially suspended aluminium nitride waveguide in the visible range;Optics Express;2022-07-12

4. Single-Atom Catalysts Designed and Prepared by the Atomic Layer Deposition Technique;ACS Catalysis;2021-06-02

5. Touch Sensor Based on Flexible AlN Piezocapacitor Coupled With MOSFET;IEEE Sensors Journal;2020-07-01

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