Computer simulation of gas rarefaction effects and film deposition characteristics in a magnetron sputtering apparatus
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference13 articles.
1. The thermalization of energetic atoms during the sputtering process
2. Applications of Monte Carlo simulation in the analysis of a sputter‐deposition process
3. Monte Carlo calculations of the properties of sputtered atoms at a substrate surface in a magnetron discharge
4. Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge
5. Step Coverage, Uniformity and Composition Studies Using Integrated Vapour Transport and Film-Deposition Models
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2. Gas rarefaction in high power impulse magnetron sputtering: comparison of a particle simulation and volume-averaged models;Plasma Sources Science and Technology;2018-11-22
3. Hot target magnetron sputtering for ferromagnetic films deposition;Surface and Coatings Technology;2018-01
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5. Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons;Plasma Sources Science and Technology;2014-03-17
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