UV annealing of ultrathin tantalum oxide films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference15 articles.
1. Investigation on Leakage Current Reduction of Photo‐CVD Tantalum Oxide Films Accomplished by Active Oxygen Annealing
2. Deposition of tantalum oxide films by ArF excimer laser chemical vapour deposition
3. Sputtered Ta2O5 antireflection coatings for silicon solar cells
4. Characteristics of high quality tantalum oxide films deposited by photoinduced chemical vapor deposition
5. UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs
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