Laser plasma-induced damage characteristics of Ta2O5 films
Author:
Funder
Department of Science and Technology of Sichuan Province
National Natural Science Foundation of China (NSFC)
Publisher
The Optical Society
Subject
Electronic, Optical and Magnetic Materials
Reference24 articles.
1. Material and electrical characterizations of high-k Ta2O5 dielectric material deposited on polycrystalline silicon and single crystalline substrate
2. Effects of different post-treatment methods on optical properties, absorption and nanosecond laser-induced damage threshold of Ta2O5 films
3. First-principles studies of Ta2O5polymorphs
4. Hollow waveguides with low intrinsic photoluminescence fabricated with Ta2O5 and SiO2 films
5. Complementary ab initio and X-ray nanodiffraction studies of Ta2O5
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