Tungsten nitride films grown via pulsed laser deposition studied in situ by electron spectroscopies-Reference-Cited by-同舟云学术

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Tungsten nitride films grown via pulsed laser deposition studied in situ by electron spectroscopies

Published:2003-05 Issue:1-4 Volume:214 Page:58-67
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Soto G.,de la Cruz W.,Castillón F.F.,Dı́az J.A.,Machorro R.,Farı́as M.H.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference28 articles.

1. Structural properties and nitrogen-loss characteristics in sputtered tungsten nitride films

2. Structural studies of amorphous and crystallized tungsten nitride thin films by EFED, XRD and TEM

3. Effect of oxygen on residual stress and structural properties of tungsten nitride films grown by reactive magnetron sputtering

4. Effect of dc bias on the compositional ratio of WNX thin films prepared by rf-dc coupled magnetron sputtering

5. D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.

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