Effect of oxygen on residual stress and structural properties of tungsten nitride films grown by reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference24 articles.
1. L.E. Toth, Transition Metal Carbides and Nitrides, Academic Press, New York, 1971.
2. Characterization of low pressure chemically vapor-deposited tungsten nitride films
3. Nitridation of fine grain chemical vapor deposited tungsten film as diffusion barrier for aluminum metallization
4. WNx: Properties and applications
5. Electrical resistivity, structure and composition of d.c. sputtered WNx films
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