Aluminum doping of epitaxial silicon carbide

Author:

Forsberg U,Danielsson Ö,Henry A,Linnarsson M.K,Janzén E

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference16 articles.

1. Step-controlled epitaxial growth of SiC: High quality homoepitaxy

2. U. Forsberg, A. Henry, Ö. Danielsson, N. Rorsman, J. Eriksson, Q. Wahab, L. Storasta, M.K. Linnarsson, E. Janzén, Proc. of the MRS 2000 Fall Meeting (Boston, USA, Nov 27–Dec 1 2000) Materials Science Research Society Symposium Proceedings vol. 640 (2000) H2.3.

3. O. Kordina, Growth and Characterisation of Silicon Carbide Power Device Material, Dissertation. Thesis No. 352, Linköping University, Linköping, Sweden, 1994.

4. K. Larsson, Department of Material Chemistry, Uppsala University, private communication.

5. G.B. Stringfellow, Organometallic Vapor-Phase Epitaxy Theory and Practice, 2nd Edition. Academic Press, New York, 1999 ISBN: 0-12-673842-4.

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