Affiliation:
1. Université Claude Bernard Lyon 1
2. Univ. Grenoble Alpes
Abstract
Because the well-known site-competition and step-controlled epitaxy rules cannot reasonably describe all the incorporation processes of the main impurities (Al and N) into 4H-SiC during epitaxy, the concept of replacement incorporation was proposed and applied to explain the experimental results published so far. In this model, the transient formation of C or Si vacancies at the surface or sub-surface of terraces is proposed to play a key role by destabilizing the impurities sitting on them. In addition to the availability of these vacancies at the surface, desorption was proposed to be a very important limiting process for Al incorporation while only occasionally relevant for N incorporation. The main 4H-SiC epitaxial growth parameters are reviewed and discussed according to the proposed replacement model.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science