LIGA Technology for R&D and Industrial Applications-Reference-Cited by-同舟云学术

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LIGA Technology for R&D and Industrial Applications

Published:2006 Issue: Volume: Page:853-899
ISSN:
Container-title:MEMS
language:
Short-container-title:

Author:

Wallrabe Ulrike,Saile Volker

Publisher

Elsevier

Reference39 articles.

1. Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoformung and plastic molding (LIGA-process);Becker;Microelectr. Eng.,1986

2. SU-8: a lowcost negative resist for MEMS;Lorenz;J. Micromech. Microeng.,1997

3. High resolution X-ray mask fabrication by a 100 keV electron-beam lithography system;Wang;J. Micromech. Microeng.,2004

4. Arbeitsmasken für die Röntgentiefenlithographie, 5;Hein,2004

5. Influence of developer temperature and resist material on the structure quality in deep X-ray lithography;Pantenburg;J. Vac. Sci. Technol.,1998

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