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Patterning of an electron beam resist with a scanning tunnelling microscope operating in air

  • Published:1995-08 Issue:2 Volume:264 Page:259-263
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Kragler K.,Günther E.,Leuschner R.,Falk G.,von Seggern H.,Saemann-Ischenko G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrodes for nanodot-based gas sensors;Sensors and Actuators B: Chemical;2005-03-28

2. Electron-Beam ULSI Applications;Handbook of VLSI Microlithography;2001

3. Low Energy Electron Degradation of Poly(p-phenylenevinylene);Advanced Materials;1999-07

4. Low-voltage electron-beam lithography with scanning tunneling microscopy in air: A new method for producing structures with high aspect ratios;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-03-01

5. Scanning Probe Microscopy;Analytical Chemistry;1996-01-01
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