1. Electron-Beam Technology in Microelectronic Fabrication;Brewer,1980
2. Column design is diffraction-limited, with an optimal convergence semiangle located for the minimum beam diameter at the crossover between diffractionlimited and abberation-limited behavior.
3. Surface imaging with HMCTS on SAL-resists, a dry developable electron beam process with high sensitivity and good resolution
4. Materials and processes for microstructure fabrication
5. Electron-Beam Technology in Microelectronic Fabrication;Greeneich,1980