Pulsed laser induced modifications of metal silicide layers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference16 articles.
1. Nanosecond laser-induced phase transitions and metastable phases quenching
2. Fundamentals of Beam-Solid Interaction and Transient Thermal Processing;Baeri,1988
3. Epitaxial silicide formation by multi‐shot irradiation of Ni thin films on Si with Nd laser
4. Electron beam induced reactions in metal/Si systems
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1. Enhancing superconductivity in CoSi2 films with laser annealing;Journal of Applied Physics;2024-09-09
2. Design on Formation of Nickel Silicide by a Low‐Temperature Pulsed Laser Annealing Method to Reduce Contact Resistance for CMOS Inverter and 6T‐SRAM on a Wafer‐Scale Flexible Substrate;Advanced Electronic Materials;2023-10-15
3. Pt-doped Ni-silicide films formed by pulsed-laser annealing: Microstructural evolution and thermally robust Ni1-xPtxSi2 formation;Journal of Alloys and Compounds;2019-06
4. Observation of heterostructure epitaxy of Pt-doped Ni-monosilicide on Si(001);Microelectronic Engineering;2019-01
5. Pulsed Laser Annealing Technology for Nano-Scale Fabrication of Silicon-Based Devices in Semiconductors ☆;Advances in Laser Materials Processing;2018
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