Use of the ring gap plasmatron for high rate sputtering-Reference-Cited by-同舟云学术

Use of the ring gap plasmatron for high rate sputtering

Published:1977-01 Issue: Volume:40 Page:327-334
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Schiller S.,Heisig U.,Goedicke K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. S. Schiller, U. Heisig and K. Goedicke, 5th Conf., Physik und Technik des Hochvakuums—Dünne Schichten, Dresden, 1975; Int. Conf. Metallurgical Coatings, San Francisco, 1976.

2. U. Heisig, S. Schiller and K. Goedicke, Int. Conf. Metallurgical Coatings, San Francisco, 1976.

3. Documentation,1972

4. Fisika i Primenenie Plasmennich Uskoritelej;Dorodnov,1973

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