Low-temperature AlN film deposition using magnetic mirror-type magnetron cathode for low gas pressure operation-Reference-Cited by-同舟云学术

Low-temperature AlN film deposition using magnetic mirror-type magnetron cathode for low gas pressure operation

Published:2020-05 Issue:3 Volume:38 Page:032205
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Motomura Taisei¹^ORCID,Tabaru Tatsuo¹,Uehara Masato¹,Fujio Yuki¹,Okuyama Tetsuya²

Affiliation:

1. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology, 807-1 Shuku-machi, Tosu, Saga 841-0052, Japan

2. Department of Materials System Engineering, NIT, Kurume College, 1-1-1 Komorino, Kurume, Fukuoka 830-8555, Japan

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5129720

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