On the development of increasing surface roughness during ion sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference30 articles.
1. Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemission
2. Evaluation of concentration-depth profiles by sputtering in SIMS and AES
3. Depth resolution in sputter profiling
4. Comment on “Evaluation of concentration-depth profiles by sputtering in SIMS and AES” by S. Hofmann
5. The statistical sputtering contribution to resolution in concentration-depth profiles
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