Evaluation of concentration-depth profiles by sputtering in SIMS and AES-Reference-Cited by-同舟云学术

Evaluation of concentration-depth profiles by sputtering in SIMS and AES

Published:1976-01 Issue:1 Volume:9 Page:59-66
ISSN:0340-3793
Container-title:Applied Physics
language:en
Short-container-title:Appl. Phys.

Author:

Hofmann S.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,General Engineering

Link

http://link.springer.com/content/pdf/10.1007/BF00901910.pdf

Reference32 articles.

1. G.K. Wehner, G.S. Anderson: In:Handbook of Thin Film Technology McGraw Hill, New York 1970, Chapter 3

2. H.E. Beske: In:Quantitative Analysis with Electron Microprobes and Secondary Ion Mass Spectrometry, ed. by E. Preuss, Ber. d. KFA Jülich, Jül-Conf.8 (1973), p.249

3. H.W.Werner: In:Quant. Analysis with EMPand SIMS, Jül-Conf.8 (1973), p. 239

4. A. Benninghoven: Appl. Phys.1, 3 (1973)

5. R.E. Weber: Res. Dev.23, 22 (1972)

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