Cost-effective processing by atomic layer epitaxy-Reference-Cited by-同舟云学术

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Cost-effective processing by atomic layer epitaxy

Published:1993-03 Issue:1-2 Volume:225 Page:96-98
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Suntola Tuomo

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Atomic layer epitaxy

2. Chemistry in Two Dimensions: Surfaces;Somorjai,1981

3. A. Rautiainen, Y. Koskinen, J. Skarp and S. Lindfors, Microchemistry Ltd., unpublished results.

4. Atomic Layer Epitaxy

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxygen-Free Atomic Layer Deposition of Indium Sulfide;ACS Applied Materials & Interfaces;2014-07-25

2. Atomic layer deposition of TiN for the fabrication of nanomechanical resonators;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-03

3. Atomic Layer Deposition: An Overview;Chemical Reviews;2009-11-30

4. Characteristics of SiO₂ Film Grown by Atomic Layer Deposition as the Gate Insulator of Low-Temperature Polysilicon Thin-Film Transistors;Solid State Phenomena;2007-06

5. Electronic properties of SiC surfaces and interfaces: some fundamental and technological aspects;Applied Physics A;2006-09-20

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