Surface and interface analysis for the development of VLSI devices

Author:

Grasserbauer M

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference68 articles.

1. Manufacturing process technology for MOS VLSI;Voltmer,1981

2. Microstructure Fabrication in Electronic Devices

3. Semiconductor integrated circuit technology;Thomas,1973

4. Material Science, Chemistry and Physics at Small Dimensions;Ruoff,1982

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3. Reliability physics of electronic devices through material characterization and environmental stress testing techniques;Microelectronics Reliability;1994-02

4. Solid state mass spectrometry for materials science;Pure and Applied Chemistry;1992-01-01

5. Elemental trace analysis of surfaces and interfaces: goals, accomplishments and challenges;Philosophical Transactions of the Royal Society of London. Series A: Physical and Engineering Sciences;1990-10-15

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