Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference9 articles.
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2. Formation of thin SiO2 films by high dose oxygen ion implantation into silicon and their investigation by IR techniques
3. Proc. Int. Conf. on Application of Ion Beams to Semiconductor Technology;Blamires,1967
4. European Conf. on Ion Implantation;Freeman,1970
5. Ion Implantation in Semiconductors,1971
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