Microstructural changes in vapour-deposited silver, copper and gold films investigated by internal stress measurements
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Basic Problems in Thin Film Physics;Bachmann,1965
2. The effect of exposure to air on silver and gold films deposited in ultra-high vacuum
3. In situ determination of the structure of thin metal films by internal stress measurements: Structure dependence of silver and copper films on oxygen pressure during deposition
4. The influence of O2, H2, H2O, N2, CO and CH4 on the structure of thin silver films investigated by ultrahigh vacuum internal stress measurements
5. R. Koch, H. Leonhard and R. Abermann, to be published.
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