In situ determination of the structure of thin metal films by internal stress measurements: Structure dependence of silver and copper films on oxygen pressure during deposition-Reference-Cited by-同舟云学术

In situ determination of the structure of thin metal films by internal stress measurements: Structure dependence of silver and copper films on oxygen pressure during deposition

Published:1980-03 Issue:2 Volume:66 Page:217-232
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Abermann R.,Koch R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Proc. 7th Int. Vacuum Congr. and 3rd Int. Conf. on Solid Surfaces;Mäser,1977

2. Structure and internal stress in ultra-thin silver films deposited on MgF2 and SiO substrates

3. Electron microscope structure and internal stress in thin silver and gold films deposited onto MgF2 and SiO substrates

4. Internal stress of thin silver and gold films and its dependence on gas adsorption

5. R. Abermann, H. P. Martinz and R. Kramer, Thin Solid Films, to be published.

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