In situ observations on amorphous versus crystalline growth of silicon by chemical vapour deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Structure of chemically deposited polycrystalline-silicon films
2. Structures of Si Films Chemically Vapor-Deposited on Amorphous SiO2Substrates
3. Crystallization of amorphous Si films formed by chemical vapor deposition
4. Crystallization in amorphous silicon
5. Temperature dependence of the growth rate of silicon prepared through chemical vapor deposition from silane
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1. AFM and TEM Examination of Surface Grains in LPCVD Silicon Films;MRS Proceedings;2000
2. Zone Descriptions of Film Structure-A Rationale;MRS Proceedings;1993
3. Stress and Microstructure in Phosphorus Doped Polycrystalline Silicon;MRS Proceedings;1992
4. Hexagonal phase in tensile low-pressure CVD poly-Si film;Proceedings, annual meeting, Electron Microscopy Society of America;1991-08
5. Models of the processes at the substrate surface in the CVD method;Ceramics International;1991-01
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