Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering-Reference-Cited by-同舟云学术

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Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering

Published:1993-11 Issue:1-2 Volume:235 Page:62-70
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Wahlström U.,Hultman L.,Sundgren J.-E.,Adibi F.,Petrov I.,Greene J.E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. Oxidation kinetics of TiN thin films

2. On structure and properties of sputtered Ti and Al based hard compound films

3. Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphere

4. Selective oxidation and chemical state of Al and Ti in (Ti, Al)n coatings

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