Mechanical wear behavior between CeO2(100), CeO2(110), CeO2(111), and silicon studied through atomic force microscopy-Reference-Cited by-同舟云学术

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Mechanical wear behavior between CeO2(100), CeO2(110), CeO2(111), and silicon studied through atomic force microscopy

Published:2021-01 Issue: Volume:153 Page:106616
ISSN:0301-679X
Container-title:Tribology International
language:en
Short-container-title:Tribology International

Author:

Xie Lile,Cheng Jie,Wang Tongqing,Lu Xinchun

Funder

National Natural Science Foundation of China

Scientific Research Projects of Education Department of Henan Province

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials

Reference34 articles.

1. Selective chemical mechanical polishing of silicon dioxide over silicon nitride for shallow trench isolation using ceria slurries;Dandu Veera;J Electrochem Soc,2009

2. Role of different additives on silicon dioxide film removal rate during chemical mechanical polishing using ceria-based dispersions;Dandu;J Electrochem Soc,2010

3. Abrasive and additive interactions in high selectivity STI CMP slurries;Praveen;Microelectron Eng,2014

4. Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries;Penta;Appl Surf Sci,2013

5. Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions;Penta;Colloids Surf A Physicochem Eng Asp,2013

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1. Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping;Applied Surface Science;2025-01

2. New skin corrosion effect of magnetorheological electro-Fenton polishing investigated by friction and wear experiments;Materials Science in Semiconductor Processing;2024-12

3. Revealing the promotion/inhibition mechanism of CO32- in the oriented electrocatalytic conversion of ethane to 2-propanol and acetone;Applied Catalysis B: Environment and Energy;2024-09

4. ZIF 67@Ce-MOF derived Co-N-C@CeO2-C for separator modification of lithium sulfur batteries;Materials Research Bulletin;2024-07

5. Nd-doped porous CeO2 abrasives for chemical mechanical polishing of SiO2 films;Materials Science in Semiconductor Processing;2024-06

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