Author:
Dandu P. R. Veera,Peethala B. C.,Babu S. V.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference84 articles.
1. Chemical processes in glass polishing
2. Mechanism of polishing of SiO2 films by CeO2 particles
3. Y. Homma, T. Masuda, J. Nair, and J. Shen , inProceedings of International Conference on Planarization/CMP Technology, Japan Planarization and CMP Technical Committee, The Japan Society of Precision Engineering, p. 35 (2009).
Cited by
55 articles.
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