Nd-doped porous CeO2 abrasives for chemical mechanical polishing of SiO2 films
Author:
Funder
Jilin Provincial Science and Technology Department
Publisher
Elsevier BV
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping;Applied Surface Science;2025-01
2. Development of Ce/Cu co-doped dendritic mesoporous silica nanoparticles (DMSNs) as novel abrasive systems toward high-performance chemical mechanical polishing;Ceramics International;2024-09
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