Modelling bed dimension for fluidized bed chemical vapour deposition

Author:

Chung Young Mi

Funder

Korea University of Technology and Education

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference51 articles.

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3. Berenbaum, D., Duke, D.A., Hauf, H., Petri, R., Favreau, J-C., 2021. Method for depositing uniform tungsten layers by CVD, US Patent number: 6,066,366.

4. Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapour deposition reactor;Breiland;J. Electrochem. Soc.,1991

5. Organometallic vapour phase epitaxy;Breiland;Mater. Sci. Eng.,1999

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