Transient analysis and process optimization of the spatial atomic layer deposition using the dynamic mesh method-Reference-Cited by-同舟云学术

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Transient analysis and process optimization of the spatial atomic layer deposition using the dynamic mesh method

Published:2020-05 Issue: Volume:217 Page:115513
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Cong Wentao,Li Zoushuang,Cao Kun,Feng Guang,Chen Rong

Funder

National Natural Science Foundation of China

Flexible Electronics Research Center of HUST & Analytic Testing Center of HUST

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference42 articles.

1. Spatial atomic layer deposition of ZnO/TiO2 nanolaminates;Chen;J. Vacuum Sci. Technol. A: Vacuum Surf. Films,2016

2. Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition;Deng;J. Vacuum Sci. Technol. A: Vacuum Surf. Films,2016

3. Selective area spatial atomic layer deposition of ZnO, Al2O3, and aluminum-doped ZnO using poly(vinyl pyrrolidone);Ellinger;Chem. Mater.,2014

4. Atomic-scale simulation of ALD chemistry;Elliott;Semicond. Sci. Technol.,2012

5. Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water;Gakis;Chem. Eng. Sci.,2019

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