Silicon homoepitaxial thin films via silane pyrolysis: A HEED and Auger electron spectroscopy study
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference43 articles.
1. Semiconductor Silicon;Richman,1969
2. Silicon Device Processing;Simpson,1970
3. A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques I.—experimental methods
4. Epitaxial Growth of Silicon from the Pyrolysis of Monosilane on Silicon Substrates
5. A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques
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