Structure analysis of O2 and H2O chemisorption on a Si{100} surface-Reference-Cited by-同舟云学术

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Structure analysis of O2 and H2O chemisorption on a Si{100} surface

Published:1994-01 Issue:1-3 Volume:301 Page:285-294
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Bu H.,Rabalais J.W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference34 articles.

1. Models for the oxidation of silicon

2. Surface Vibrations of Silicon Detected by Low-Energy Electron Spectroscopy

3. Vibrational study of the initial stages of the oxidation of Si(111) and Si(100) surfaces

4. Chemisorption of Atomic Oxygen on Si(100): Self-Consistent Cluster and Slab Model Investigations

5. Theoretical study of the adsorption of oxygen on Si(100)

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2. Carrier radiation distribution in organic light-emitting diodes;Frontiers of Optoelectronics in China;2010-11-16

3. Chemistry on Silicon Surfaces;PATAI'S Chemistry of Functional Groups;2009-12-15

4. Difficulty for oxygen to incorporate into the silicon network during initial O2 oxidation of Si(100)-(2×1);The Journal of Chemical Physics;2007-03-21

5. Surface SN2 Reaction by H2O on Chlorinated Si(100)-2 × 1 Surface;The Journal of Physical Chemistry B;2005-05-04

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