Theoretical study of the adsorption of oxygen on Si(100)-Reference-Cited by-同舟云学术

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Theoretical study of the adsorption of oxygen on Si(100)

Published:1984-04 Issue:2 Volume:2 Page:1075-1078
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Batra Inder P.,Bagus P. S.,Hermann K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.572658

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma-activated silicon–glass high-strength multistep bonding for low-temperature vacuum packaging;Chemical Engineering Journal;2023-09

2. Direct bonding of silicon and quartz glass using VUV/O3 activation and a multistep low-temperature annealing process;Applied Surface Science;2018-09

3. Theoretical study of luminescence degradation by oxidation in Si(001) and Si(111) ultrathin films: Gap states induced by oxidation;Physical Review B;1999-09-15

4. Hartree–Fock study of the Si(l00) reconstruction;Journal of Molecular Structure: THEOCHEM;1998-01

5. Structure analysis of O2 and H2O chemisorption on a Si{100} surface;Surface Science;1994-01

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