Difficulty for oxygen to incorporate into the silicon network during initial O2 oxidation of Si(100)-(2×1)-Reference-Cited by-同舟云学术

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Difficulty for oxygen to incorporate into the silicon network during initial O2 oxidation of Si(100)-(2×1)

Published:2007-03-21 Issue:11 Volume:126 Page:114707
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Hemeryck A.,Mayne A. J.,Richard N.,Estève A.,Chabal Y. J.,Djafari Rouhani M.,Dujardin G.,Comtet G.

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2566299

Reference45 articles.

1. Silanone(Si=O)on Si(100): intermediate for initial silicon oxidation

2. Vibrational study of the initial stages of the oxidation of Si(111) and Si(100) surfaces

3. Oxidation of Clean Ge and Si Surfaces

4. Electron orbital energies of oxygen adsorbed on silicon surfaces and of silicon dioxide

5. Initial stages of oxygen adsorption on Si(111): The stable state

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